The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

• Victor Deinhart,
• Lisa-Marie Kern,
• Jan N. Kirchhof,
• Sabrina Juergensen,
• Joris Sturm,
• Enno Krauss,
• Thorsten Feichtner,
• Sviatoslav Kovalchuk,
• Michael Schneider,
• Dieter Engel,
• Bastian Pfau,
• Bert Hecht,
• Kirill I. Bolotin,
• Stephanie Reich and
• Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

• -mat are presented. Keywords: automated patterning; focused He ion beam; graphene; magnetic multilayers; mechanical resonator; pattern generation; plasmonic antennas; two-dimensional materials; Introduction Future breakthroughs in nanotechnology will rely on the ability to fabricate materials and

• to match desired geometric constraints, an automated pattern generation process can construct the complete pattern from few user-provided parameters by exploiting the defined constraints. This provides easy access to systematic variation of geometries and raster strategies. Finally, for complex

• pattern geometries, especially with curved edges, the available features of commercial patterning control software are not sufficient to even create the corresponding adapted beam paths. To address these issues, we developed the pattern generation toolbox FIB-o-mat with a Python interface. FIB-o-mat

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• , enabling multiproject wafers for chip-development purposes. The prototype multibeam tool at TU Delft has 196 electron beams and has been used as an electron beam deposition (EBID) writer. Negative tone pattern generation is achieved by electron beam decomposition of a gas precursor as shown schematically

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• top and side surface. A selection of possible tip shapes is shown in Figure 15c. 4.5 Comparison to other 3D pattern generation software approaches To the best of our knowledge, only one other software approach for 3D FEBID pattern generation has been published, namely by Fowlkes et al. [27] in

Porous polymer coatings as substrates for the formation of high-fidelity micropatterns by quill-like pens

• Michael Hirtz,
• Marcus Lyon,
• Wenqian Feng,
• Andrea E. Holmes,
• Harald Fuchs and
• Pavel A. Levkin

Beilstein J. Nanotechnol. 2013, 4, 377–384, doi:10.3762/bjnano.4.44

• Discussion Pattern generation The microarrays were fabricated by spotting the dye solution with quill-like microchannel cantilevers, called surface patterning tools (SPTs) [9], attached to a dip-pen nanolithography (DPN) platform (NLP 2000, NanoInk, USA) for precise control in x- y- and z-direction (Figure 1

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• electron doses are needed in order to achieve a proper SAM reduction. This effect is also known from conventional lithography techniques and is called the “proximity effect” [17][18]. Unfortunately, higher doses and prolonged exposure times result in blurry and diffuse pattern generation. In order to

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters